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Advances in CMP/polishing technologies for the manufacture of electronic devices / edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa. by
Edition: 1st ed.
Material type: Text Text; Literary form: Not fiction
Language: English
Publication details: Oxford : William Andrew, 2012
Online resources:
Availability: Items available for loan: National Library of India (1).

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2.
Advances in CMP Polishing Technologies [Electronic resource]/ Edited by Toshiro Doi, Ioan D. Marinescu and Syuhei Kurokawa by
Material type: Text Text; Format: electronic ; Literary form: Not fiction
Publication details: Amsterdam: Elsevier, 2011
Online resources:
Availability: Items available for loan: National Library of India (1).

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