TY  - BOOK
AU  - Bakshi,Vivek
TI  - EUV sources for lithography
SN  - 0819458457
U1  - 621.364 22
PY  - 2006///
CY  - Bellingham, Wash.
PB  - SPIE Press
KW  - Ultraviolet radiation
KW  - Industrial applictions
KW  - Plasma (Ionized gases)
KW  - Lithography
N1  - Includes bibliographical references and index
ER  -